Contamination-Free Manufacturing for Semiconductors and Other Precision Products

Contamination-Free Manufacturing for Semiconductors and Other Precision Products

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Recognizing the need for improved control measures in the manufacturing process of highly sensitized semiconductor technology, this practical reference provides in-depth and advanced treatment on the origins, procedures, and disposal of a variety of contaminants. It uses contemporary examples based on the latest hardware and processing apparatus to illustrate previously unavailable results and insights along with experimental and theoretical developments. Ensures the proper methods necessary to meet the standards established in the 1997 National Technology Roadmap for Semiconductors (NTRS)! Summarizing up-to-date control practices in the industry, Contamination-Free Manufacturing for Semiconductors and Other Precision Products: Details the physics and chemistry behind the mechanisms leading to contamination-induced failures Considers particles and molecular contaminants, including the entire spectrum of mass-based contaminants Outlines primary contamination problems and target control levels Reveals and offers solutions to inadequate areas of measurement capability and control technology Clarifies significant problems and decisions facing the industry by analyzing NTRS standards and contamination mechanisms Containing over 700 literature references, drawings, photographs, equations, and tables, Contamination-Free Manufacturing for Semiconductors and Other Precision Products is an essential reference for electrical and electronics, instrumentation, process, manufacturing, development, contamination control and quality engineers; physicists; and upper-level undergraduate and graduate students in these disciplines.... the oxidation species in solution at the particular pH and concentration can be measured with a simple Pt electrode. This will be further referred to as the redox potential of the solution. It is in fact the redox potential of the actual oxidizing species measured at open circuit (l = 0) vs. the NHE. ... UPW B DHF O 1E+16 (0 Bare-Si, Pt100) Cu: 1ppm - Dipping time: 10mln 3 1E+15 1E+17 a€c UPW HC1 H2SO4 ^.


Title:Contamination-Free Manufacturing for Semiconductors and Other Precision Products
Author: Robert P. Donovan
Publisher:CRC Press - 2001-03-14
ISBN-13:

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